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Antoine Wojdyla , Ph.D.

I am a researcher in optics, working at Lawrence Berkeley National Laboratory at the Advanced Light Source (Berkeley's synchrotron), where I study x-rays and how we can probe matter using x-ray microscopy, so that researchers can study matter at the nanoscale, with application ranging from battery research to quantum computing.

I am also involved with research in Extreme-Ultraviolet lithography — the next generation in microchip fabrication, working in close collaboration with semi-conductor companies such as Intel, Samsung and formerly IBM. My research unit is the Center for X-Ray Optics, where I am part of the SHARP EUV Microscope team, working on extreme-ultraviolet photomask inspection.

I am very interested in everything wave and especially the relations between light, matter and computers – software and hardware. Here is a summary of my professionnal experience, but you can learn more about my research or have a look at some of my personal projects.


view from my office

A view of the bay from the office, at sunset


Work Experience

2016— Lawrence Berkeley National Laboratory, Berkeley, CA - USA
Advanced x-ray optics project scientist
I'm working on ALS-U, the DLSR upgrade of the ALS, a seven-year, $300M project where the goal is to produce diffraction-limited soft X-ray beams by pushing physics to the extreme. My main role is to design and study wavefront sensors and adaptive optics for the x-ray range, through simulations and experiments, working hand-in-hand with all the scientists and engineers to solve the many challenges regarding vacuum environment, vibrations and manufacturing tolerances.
2012-2016 Lawrence Berkeley National Laboratory, Berkeley, CA - USA
Postdoctoral fellow
I've worked at the Center for X-Ray Optics, on x-ray microscopy within the SHARP EUV Microscope team, where we study nanometer scale defects on extreme-ultraviolet photo-masks,for customers such as Intel, IBM or Samsung. My main area of research novel imaging techniques and imaging processing based on illumination diversity, and metroology. I've also worked on the next generation microexposure tool (MET5), on prototyping, tolerancing and qualification of sub-elements, but also software architecture and stage controls.
2008-2012 Lab for Optics & Biosciences (Ecole Polytechnique - CNRS - INSERM), Palaiseau - France
Ph.D. in Optics
I've worked on terahertz radiations, in order to probe biologicial sample with far-infrared, ultra-short pulses, developping imaging techniques based on the manipulation of polarization and evanescent waves for the study of ion transport in neurons. My PhD dissertation is entitled "Polarization of terahertz waves in the subsingle-cycle regime and application to imaging in biology"
2008-2011 Université Paris-Sud, Orsay - France
Assistant lecturer
Teachings in Digital Signal Processing at graduate level (Polytech’Paris-Sud Opto-electronics division).
Labclasses in Optics and DSP at Université Paris-Sud, and THz science experimental activities at École Polytechnique
2008 Thales Technology Center Singapore, Singapore
Engineering intern
I’ve worked on the design and the prototyping of a high-speed, free-space optical communication scheme for commercial use in aircrafts. The solution makes use of computer-generated holograms, fiber optics and advanced modulation schemes (OFDM).
2007 Valtionen Teknillinen Tutkimuskeskus (VTT) - Technological Center of Finland, Oulu - Finland
Research intern
I’ve worked on the nano-imprinting process of subwavelength anti-reflective structures, alongside with the determination of physical properties of thin-film solar cells (CIGS).
2006 smart S.A.S. France, Hambach - France.
Regular worker
I've worked as a regular worker on the assembly line, mainly mounting headlights on the 2-seated cars.

Education

2008-2012 École Polytechnique, Lab for Optics & Biosciences, Palaiseau - France
Ph.D. in Optics - summa cum laude
Top French engineering school and research center.
2005-2008 École Centrale de Marseille, Marseille - France
Master's Degree in engineering
Major : Optics and Photonics. Complementary courses in medical imaging.
2008 Université Aix-Marseille, Marseille - France
M.Sc. in Optics and Image Processing - magna cum laude
Major : Optics and Electromagnetism
2003-2005 Lycée Kléber, Strasbourg - France
Preparatory classroom
MPSI/MP
2003 Lycée de Iles du Nord, Saint-Martin (French West Indies)
Baccalauréat scientique - first class honors (mention TB)

I grew up on the island of Guadeloupe, in the French West Indies, since the age of 9.

Complementary education

"Physics of femtosecond pulses" CNRS Workshop in Les Houches (France) (1 week)

"Negotiation and Management" doctoral school seminaries (2 weeks)

"Research valorization through the creation of start-ups" residential seminary (1 week)

"Creation of Start-ups" École Polytechnique course (40h+)

Languages

Spoken languages

French mother tongue
English fluent (TOEIC score : 930/990)
Spanish good knowledge
other basics of Chinese, French Creole, Latin, Ancient Greek

Programming languages

C, C# (advanced knowledge), Python, PHP
Windows, MacOS, Linux
Matlab, Zemax (adv. knowledge), Labview Code V, Meep
Word, Excel, Powerpoint, Latex, etc.

Centers of interest

General : science, literature, philosophy, epistemology, DIY electronics (Arduino), photography

Sports : windsurf, sailing (nautical CV), Viet-Vo-Dao, biking

Associations : Massilia Défi Voile, X’Doc, SPIE Student Chapter

Travels : Europe (UK, Germany, Italy, Spain, etc.), Asia (South-East Asia, Japan), US (CA, FL, TX, DC)

sailing in the Caribbean

Scientific comunications

Publications

Direct patterning of micro-optical structures by combined nanoimprinting and lithography
Jarkko Tuominen, Jussi Hiltunen, A. Wojdyla et al. in Proceedings of SPIE 69920B-69920B-8 (2008) — pdf

Beam waist measurement for terahertz time-domain spectroscopy experiments
A Podzorov, A Wojdyla, G. Gallot in Optics Letters 35, 7, 901-903 (2010) —pdf

Brewster’s angle silicon wafer terahertz linear polarizer
A Wojdyla, G Gallot, in Optics Express 19,15, pp. 14099-14107 (2011) — pdf

Total Internal Reflection Terahertz Imaging
A Wojdyla, G Gallot in Proc. 36th IRMMW-THz Conference (2011) —pdf

Achromatic polarizing elements for pulsed THz waves
A Wojdyla, G Gallot in Proc. 36th IRMMW-THz Conference (2011) — pdf

Attenuated Internal Reflection Terahertz Imaging
A Wojdyla, G Gallot in Optics Letters 38, 2, pp. 112-114 (2013) —pdf

Phase noise investigation in terahertz time-domain spectroscopy measurements
A Wojdyla, G Gallot, IRMMW-THz Conference (2013) — pdfextended draft

“Spectral phase, temporal phase and carrier-enveloppe phase of sub-single cycle terahertz pulses”
A Wojdyla, G Gallot, in preparation (2012)

Ptychographic wavefront sensor for high-NA EUV inspection and exposure tools
A Wojdyla, R Miyakawa, P Naulleau in Proc. SPIE Extreme Ultraviolet Lithography V, 904839 (2014) — pdf

Coded aperture detector : an image sensor with sub 20-nm pixel resolution
R Miyakawa, R Mayer, A Wojdyla et al. in Optics Express 22, 16 (2014) — draft

Actinic mask imaging: recent results and future directions from the SHARP EUV microscope
K G Goldberg, M P Benk, A Wojdyla et al. in Proc. SPIE Extreme Ultraviolet Lithography V, 90480Y (2014) — pdf

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope
M P Benk, R Miyakawa, W Chao, Y Wang A. Wojdyla et al. in Journal of Micro/Nanolithography, MEMS, and MOEMS 14, 1 (2015)

Aberration estimation using EUV mask roughness
R A Claus, A Wojdyla, M P Benk, K A Goldberg, A R Neureuther, P P Naulleau, L Waller in Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942214 (2015)

A method of image-based aberration metrology for EUVL tools
Z Levinson, S Raghunathan, E Verduijn, O Wood, P Mangat, K Goldberg, M Benk, A Wojdyla, V Philipsen, E Hendrickx, B W Smith in Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942215 (2015)

New ways of looking at masks with the SHARP EUV microscope
K A Goldberg ; M P Benk ; A Wojdyla et al. in Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221A (2015)

Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection
Y Wang ; R Miyakawa ; W Chao ; M Benk ; Antoine Wojdyla et al. Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221C (2015)

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging
P Mangat, E Verduijn, O R Wood, M P Benk, A Wojdyla, K A Goldberg
in Proc. SPIE 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII pdf

“Fourier Ptychography Microscopy for increased spatial resolution at extreme ultraviolet wavelengths using an angle-scanning illuminator”
A. Wojdyla, M. P. Benk, D. J. Johnson, A. Donoghue, K. A. Goldberg, in preparation_(2015)

EUV actinic brightfield mask microscopy for predicting printed defect images
K A Goldberg, M P Benk, A Wojdyla et al. in Proc. SPIE 9635, 963514 (2015)

Examination of phase retrieval algorithms for patterned EUV mask metrology
R A Claus, Y-G Wang, A Wojdyla et al. in Proc. SPIE 9635, 96350F, (2015)

Mask blank defect printability comparison using optical and SEM mask and wafer inspection and bright field actinic mask imaging
P Mangat, E Verduijn, Obert R. Wood II, et al. in Proc. SPIE 9658, 96580E (2015)

“Assessment of AIMS EUV and SHARP actinic wavelength mask defect review tools for the evaluation of blank defect printability”
E Verduijn, E Hosler, P Mangat, O Wood et al. in 2015 International Symposium on EUV Lithography

Using the SHARP EUV Microscope's aerial images to study line edge roughness
A Wojdyla, A Donoghue et al. in 2015 International Symposium on EUV Lithography

Demonstration of 22-nm half pitch resolution on the SHARP EUV microscope
M P Benk, K A Goldberg, A Wojdyla et al. in Journal of Vacuum Science and Technology B 33 (6), 06FE01 (2015)

“Actinic mask imaging: Taking a SHARP look at next generation photomasks”
M P Benk, A Wojdyla, K A Goldberg, Patrick Naulleau in 2015 International Symposium on EUV Lithography

Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope
M P Benk, A Wojdyla et al. in J. Micro/Nanolith. MEMS MOEMS 15(3), 033501 (2016) (pdf)

Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology”,
Z Levinson, E Verduijn, O R Wood, P Mangat, K A Goldberg, M P Benk, A Wojdyla and B W Smith in J. Micro/Nanolith. MEMS MOEMS 15(2), 023508 (2016) (pdf)

Ultrahigh efficiency EUV contact - hole printing with chromeless phase shift mask”,
P Naulleau, C N Anderson, W Chao, K A Goldberg, E Gullikson, F Salmassi, A Wojdyla in Proc. SPIE 99840P (2016) (pdf)

Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks
A Wojdyla, A Donoghue,M P Benk, P P Naulleau and K A Goldberg in SPIE 97760H, (2016) (pdf)

Off-axis aberration estimation in an EUV microscope using natural speckle
A Shanker, A Wojdyla et al. in 2016 Imaging and Applied Optics Congress ITh1F.2 (pdf)

Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging
P Naulleau, M Benk, K Goldberg, E Gullikson, A Wojdyla, YG Wang, and A Neureuther

Reviewer for Optics Letter, Optics Express

International conferences

European Optical Society Annual Meeting – Paris, France (October 2010)

6th Terahertz Days – La Grande-Motte, France (May 2011)

Infrared, Millimeter Waves and Terahertz Conference (IRMMW) – Houston, TX, USA (October 2011)

SPIE Extreme Ultraviolet Lithography – San Jose, CA, USA (February 2014)

SPIE Photomask Technology 2014 (SPIE/BACUS) – Monterey, CA, USA (September 2014)

EUVL Symposium 2014 – Washington, DC, USA (October 2014)

SPIE Extreme Ultraviolet Lithography – San Jose, CA, USA (February 2015)

SPIE Photomask Technology 2015 (SPIE/BACUS) – Monterey, CA, USA (September 2015)

SPIE Extreme Ultraviolet Lithography – San Jose, CA, USA (February 2016)

SPIE Photomask Technology 2016 (SPIE/BACUS) – Berkeley, CA, USA (September 2016)

Photon Diag 2017 – Menlo Park, CA, USA (May 2017)